Patents/Inventors

Hirotomo Kawahara

TokyoJP8 patents

9 Patents

US122986602025
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US122355752025
Reflective Mask Blank for EUV Lithography and Substrate with Conductive Film
AGC Inc.
0 cites
US122163972025
Reflective Mask Blank for EUV Lithography, Mask Blank for EUV Lithography, and Manufacturing Methods Thereof
AGC Inc.
0 cites
US120386852024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US119829352024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US119538222024
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US119340932024
Reflective Mask Blank for EUV Lithography and Substrate with Conductive Film
AGC Inc.
0 cites
US118222292023
Reflective Mask Blank for EUV Lithography, Mask Blank for EUV Lithography, and Manufacturing Methods Thereof
AGC Inc.
0 cites
US116985802023
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites