Patents/Inventors

Hiroto Ogata

ToyamaJP21 patents

14 Patents

US126179782026
Semiconductor Substrate Cleaning Method, Processed Semiconductor Substrate Manufacturing Method, and Composition for Peeling
NISSAN CHEMICAL CORPORATION
0 cites
US125458632026
Method for Cleaning Semiconductor Substrate, Method for Producing Processed Semiconductor Substrate, and Stripping Composition
NISSAN CHEMICAL CORPORATION
0 cites
US125346932026
Semiconductor Substrate Cleaning Method, Processed Semiconductor Substrate Manufacturing Method, and Composition for Peeling
NISSAN CHEMICAL CORPORATION
0 cites
US125290182026
Method for Cleaning Semiconductor Substrate, Method for Producing Processed Semiconductor Substrate, and Stripping Composition
NISSAN CHEMICAL CORPORATION
0 cites
US123862622025
Resist Underlayer Film-forming Composition Using Carbon-oxygen Double Bond
NISSAN CHEMICAL CORPORATION
0 cites
US123325662025
Resist Underlayer Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US123139722025
Resist Underlayer Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US122973812025
Laminate, Release Agent Composition, and Method for Manufacturing Processed Semiconductor Substrate
NISSAN CHEMICAL CORPORATION
0 cites
US122152592025
Multilayer Object and Release Agent Composition
NISSAN CHEMICAL CORPORATION
0 cites
US120726302024
Resist Underlayer Film-forming Composition Including Cyclic Carbonyl Compound
NISSAN CHEMICAL CORPORATION
0 cites
US120449692024
Resist Underlayer Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US116740512023
Stepped Substrate Coating Composition Containing Compound Having Curable Functional Group
NISSAN CHEMICAL CORPORATION
0 cites
US116356922023
Resist Underlying Film Forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US115423662023
Composition for Forming Resist Underlayer Film and Method for Forming Resist Pattern Using Same
NISSAN CHEMICAL INDUSTRIES, Ltd.
0 cites