Patents/Inventors

Hiroshi Hanekawa

FukushimaJP9 patents

10 Patents

US122355752025
Reflective Mask Blank for EUV Lithography and Substrate with Conductive Film
AGC Inc.
0 cites
US122163982025
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US121241642024
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US120386852024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US120322802024
Reflective Mask Blank, Reflective Mask, and Method for Manufacturing Reflective Mask
AGC Inc.
0 cites
US119829352024
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites
US119340932024
Reflective Mask Blank for EUV Lithography and Substrate with Conductive Film
AGC Inc.
0 cites
US119142832024
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US117037512023
Reflective Mask Blank and Reflective Mask
AGC Inc.
0 cites
US116985802023
Reflective Mask Blank for EUV Lithography
AGC Inc.
0 cites