Hironori Oka

4 Patents

• US124812152025

  Active-light-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Formation Method, Method for Manufacturing Electronic Device, Compound, and Resin

  FUJIFILM Corporation

  0 cites
• US120449672024

  Actinic-ray-sensitive or Radiation-sensitive Resin Composition, Resist Film, Pattern Formation Method, and Method for Manufacturing Electronic Device

  FUJIFILM Corporation

  0 cites
• US117037582023

  Photosensitive Composition for EUV Light, Pattern Forming Method, and Method for Manufacturing Electronic Device

  FUJIFILM Corporation

  0 cites
• US116044142023

  Photosensitive Composition for EUV Light, Pattern Forming Method, and Method for Manufacturing Electronic Device

  FUJIFILM Corporation

  0 cites