Hiromitsu Nakashima

3 Patents

• US125608662026

  Radiation-sensitive Resin Composition, Method of Forming Resist Pattern, Polymer, and Compound

  JSR CORPORATION

  0 cites
• US116812222023

  Fluorine-containing Polymer, Purification Method, and Radiation-sensitive Resin Composition

  JSR CORPORATION

  0 cites
• US116034592023

  Resin Composition and Method of Forming Resist Pattern

  JSR CORPORATION

  0 cites