Patents/Inventors

Hirokazu Ueda

OsakaJP10 patents

11 Patents

US124865752025
Apparatus for Processing Substrate, Gas Shower Head, and Method for Processing Substrate
Tokyo Electron Limited
0 cites
US124179282025
Substrate Processing Method and Substrate Processing System
TOKYO ELECTRON LIMITED
0 cites
US124068622025
Vacuum Processing Apparatus and Oxidizing Gas Removal Method
Tokyo Electron Limited
0 cites
US122477682025
Electrocaloric Effect Element, Heat Transfer Device, Semiconductor Manufacturing Device, and Electrocaloric Effect Element Control Method
Tokyo Electron Limited
0 cites
US121129212024
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US120778652024
Film Forming Method and Film Forming Apparatus
Tokyo Electron Limited
0 cites
US120606412024
Film Forming Method and Film Forming Apparatus
TOKYO ELECTRON LIMITED
0 cites
US120117382024
Substrate Processing Method and Ionic Liquid
TOKYO ELECTRON LIMITED
0 cites
US119729292024
Processing Apparatus and Film Forming Method
Tokyo Electron Limited
0 cites
US118428862023
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US116159572023
Method for Forming Boron-based Film, Formation Apparatus
TOKYO ELECTRON LIMITED
0 cites