10 Patents
- US124682172025Mask Blank, Method of Manufacturing Transfer Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US121533382024Mask Blank, Method for Manufacturing Transfer Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US120136312024Mask Blank, Transfer Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US117622792023Mask Blank, Method for Manufacturing Reflective Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US117200142023Mask Blank, Phase Shift Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US116983602023Chirality Detection Device, Chirality Detection Method, Separation Device, Separation Method, and Chiral Substance Device
INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION NATIONAL INSTITUTES OF NATURAL SCIENCES
0 cites - US116303882023Mask Blank, Method for Manufacturing Phase Shift Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US116249792023Mask Blank, Transfer Mask, and Method of Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites - US115437442023Mask Blank, Transfer Mask, and Method for Manufacturing Semiconductor Device
HOYA CORPORATION
0 cites