Patents/Inventors

Hiroaki Iwaoka

TokyoJP8 patents

9 Patents

US123460182025
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites
US123395802025
Reflective Mask Blank for EUV Lithography and Substrate Equipped with Conductive Film
AGC Inc.
0 cites
US122986602025
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US122355742025
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites
US122226402025
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites
US121054122024
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites
US120011342024
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites
US119538222024
Reflective Mask Blank for EUV Lithography, Reflective Mask for EUV Lithography, and Method for Manufacturing Same
AGC Inc.
0 cites
US118290652023
Reflective Mask Blank, Reflective Mask, Method of Manufacturing Reflective Mask Blank, and Method of Manufacturing Reflective Mask
AGC Inc.
0 cites