4 Patents
- US124671302025Temperature-tuned Substrate Support for Substrate Processing Systems
LAM RESEARCH CORPORATION
0 cites - US123476502025Substrate Processing System Including Dual Ion Filter for Downstream Plasma
LAM RESEARCH CORPORATION
0 cites - US120572952024RF Power Compensation to Reduce Deposition or Etch Rate Changes in Response to Substrate Bulk Resistivity Variations
Lam Research Corporation
0 cites - US119674862024Substrate Processing System Including Dual Ion Filter for Downstream Plasma
LAM RESEARCH CORPORATION
0 cites