Patents/Inventors

Hikaru Tokunaga

ToyamaJP10 patents

11 Patents

US124497322025
Composition for Forming Resist Underlayer Film with Improved Film Density
NISSAN CHEMICAL CORPORATION
0 cites
US123862622025
Resist Underlayer Film-forming Composition Using Carbon-oxygen Double Bond
NISSAN CHEMICAL CORPORATION
0 cites
US123604522025
Resist Underlayer Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US122421962025
Resist Underlayer Film-forming Composition Containing Indolocarbazole Novolak Resin
NISSAN CHEMICAL INDUSTRIES, Ltd.
0 cites
US121471582024
Photocurable Composition and Method for Producing Semiconductor Device
NISSAN CHEMICAL CORPORATION
0 cites
US120726302024
Resist Underlayer Film-forming Composition Including Cyclic Carbonyl Compound
NISSAN CHEMICAL CORPORATION
0 cites
US120449692024
Resist Underlayer Film-forming Composition
NISSAN CHEMICAL CORPORATION
0 cites
US117988102023
Resist Underlayer Film-forming Composition Containing Amide Solvent
NISSAN CHEMICAL CORPORATION
0 cites
US117200242023
Resist Underlayer Film-forming Composition Containing Indolocarbazole Novolak Resin
NISSAN CHEMICAL INDUSTRIES, Ltd.
0 cites
US116812232023
Photocurable Composition and Method for Producing Semiconductor Device
NISSAN CHEMICAL CORPORATION
0 cites
US116740512023
Stepped Substrate Coating Composition Containing Compound Having Curable Functional Group
NISSAN CHEMICAL CORPORATION
0 cites