Hideyuki Ishihara

2 Patents

• US125108222025

  Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Actinic Ray-sensitive or Radiation-sensitive Film, Pattern Forming Method, Method for Manufacturing Electronic Device, Actinic Ray-sensitive or Radiation-sensitive Resin Composition for Manufacturing Photomask, and Method for Manufacturing Photomask

  FUJIFILM Corporation

  0 cites
• US120614182024

  Actinic Ray-sensitive or Radiation-sensitive Resin Composition, Actinic Ray-sensitive or Radiation-sensitive Film, Pattern Forming Method, and Photo Mask

  FUJIFILM Corporation

  0 cites