12 Patents
- US125587562026Profile Control During Polishing of a Stack of Adjacent Conductive Layers
Applied Materials, Inc.
0 cites - 0 cites
- US124475782025Compensation for Substrate Doping in Edge Reconstruction for In-situ Electromagnetic Inductive Monitoring
Applied Materials, Inc.
0 cites - 0 cites
- US123706462025Polishing Apparatus Using Machine Learning and Compensation for Pad Thickness
Applied Materials, Inc.
0 cites - US121365742024Technique for Training Neural Network for Use in In-situ Monitoring During Polishing and Polishing System
Applied Materials, Inc.
0 cites - US120573542024Trained Neural Network in In-situ Monitoring During Polishing and Polishing System
Applied Materials, Inc.
0 cites - US118656642024Profile Control with Multiple Instances of Contol Algorithm During Polishing
Applied Materials, Inc.
0 cites - US118506992023Switching Control Algorithms on Detection of Exposure of Underlying Layer During Polishing
Applied Materials, Inc.
0 cites - US117912242023Technique for Training Neural Network for Use in In-situ Monitoring During Polishing and Polishing System
Applied Materials, Inc.
0 cites - US117800452023Compensation for Substrate Doping for In-situ Electromagnetic Inductive Monitoring
Applied Materials, Inc.
0 cites - US116580782023Using a Trained Neural Network for Use in In-situ Monitoring During Polishing and Polishing System
Applied Materials, Inc.
0 cites