2 Patents
- US123114972025Method for Chemical Mechanical Polishing of a Sic Wafer Based on a Magnetorheological Elastic Metal Contact Corrosion Polishing Pad
GUANGDONG UNIVERSITY OF TECHNOLOGY
0 cites - US120836472024Magnetorheological-elastomer Polishing Pad for Chemical Mechanical Polishing of Semiconductor Wafer, Preparation Method and Application Thereof
Guangdong University Of Technology
0 cites