Hans Van Der Laan

4 Patents

• US126191602026

  Systems and Methods for Reducing Pattern Shift in a Lithographic Apparatus

  ASML NETHERLANDS B.V.

  0 cites
• US122769212025

  Substrate Comprising a Target Arrangement, and Associated at Least One Patterning Device, Lithographic Method and Metrology Method

  ASML Netherlands B.V.

  0 cites
• US122288622025

  Selection of Measurement Locations for Patterning Processes

  ASML NETHERLANDS B.V.

  0 cites
• US116812292023

  Selection of Measurement Locations for Patterning Processes

  ASML Netherlands B.V.

  0 cites