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Hans-jürgen Stock
Dachau
DE
2 patents
3 Patents
US12450408
2025
Machine Learning for Selecting Initial Source Shapes for Source Mask Optimization
Synopsys, Inc.
0 cites
US12249115
2025
Large Scale Computational Lithography Using Machine Learning Models
Synopsys, Inc.
0 cites
US11914306
2024
Predicting Defect Rate Based on Lithographic Model Parameters
Synopsys, Inc.
0 cites