Hamed Hajibabaeinajafabadi

5 Patents

• US125851852026

  Acid for Reactive Development of Metal Oxide Resists

  Tokyo Electron Limited

  0 cites
• US123325682025

  Metal Oxide Resists for EUV Patterning and Methods for Developing the Same

  TOKYO ELECTRON LIMITED

  0 cites
• US122875782025

  Cyclic Method for Reactive Development of Photoresists

  TOKYO ELECTRON LIMITED

  0 cites
• US122725582025

  Selective and Isotropic Etch of Silicon Over Silicon-germanium Alloys and Dielectrics; via New Chemistry and Surface Modification

  Tokyo Electron Limited

  0 cites
• US120026832024

  Lateral Etching of Silicon

  Tokyo Electron Limited

  0 cites