Patents/Inventors

Hakseung Han

Hwaseong-siKR5 patents

5 Patents

US122605392025
Apparatus and Method of Measuring Uniformity Based on Pupil Image and Method of Manufacturing Mask by Using the Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US119340922024
Method of Annealing Reflective Photomask by Using Laser
Samsung Electronics Co., Ltd.
0 cites
US118525832023
Apparatus and Method for Measuring Phase of Extreme Ultraviolet (EUV) Mask and Method of Fabricating EUV Mask Including the Method
Samsung Electronics Co., Ltd.
0 cites
US116353712023
Apparatus and Method for Measuring Phase of Extreme Ultraviolet (EUV) Mask and Method of Fabricating EUV Mask Including the Method
Samsung Electronics Co., Ltd.
0 cites
US115624772023
Apparatus and Method of Measuring Uniformity Based on Pupil Image and Method of Manufacturing Mask by Using the Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites