Haiqing Wei

6 Patents

• US125551842026

  Curvilinear Polygon Image Scaling Method, System and Electronic Apparatus

  Wuhan Yuwei Optical Software Co., Ltd.

  0 cites
• US123395812025

  Photolithographic Mask Optimization Method and System Without Border Defects

  WUHAN YUWEI OPTICAL SOFTWARE CO., Ltd.

  0 cites
• US123065432025

  Optical Imaging Method, Device and System for Photolithography System

  WUHAN YUWEI OPTICAL SOFTWARE CO., Ltd.

  0 cites
• US121124092024

  Method and System for Pixelating Vector Graphic Into Image

  WUHAN YUWEI OPTICAL SOFTWARE CO., Ltd.

  0 cites
• US120504072024

  Light Source Calibration Method and System Employed in Source Mask Optimization

  WUHAN YUWEI OPTICAL SOFTWARE CO., Ltd.

  0 cites
• US116876972023

  Method and System for Correcting Lithography Process Hotspots Based on Stress Damping Adjustment

  Wuhan Yuwei Optical Software Co., Ltd.

  0 cites