15 Patents
- US124085562025Piezoelectric Stack, Piezoelectric Element, and Method of Manufacturing Piezoelectric Stack
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US123061302025Electrochemical Sensor Unit, Electrode for Electrochemical Sensor, and Method of Manufacturing Electrode for Electrochemical Sensor
SUMITOMO CHEMICAL COMPANY, LIMITED
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- US121042792024Nitride Crystal Substrate and Method for Manufacturing the Same
SUMITOMO CHEMICAL COMPANY, LIMITED
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- US120028802024Method for Manufacturing Nitride-based High Electron Mobility Transistor and Nitride-based High Electron Mobility Transistor
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US119676172024Nitride Semiconductor Substrate, Laminate, Substrate Selection Program, Substrate Data Output Program, Off-angle Coordinate Map, and Methods Thereof
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US119468742024Method for Producing Nitride Semiconductor Laminate, Silicon Semiconductor Product, Method for Inspecting Film Quality and Method for Inspecting Semiconductor Growth Device
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US118057002023Laminated Substrate Having Piezoelectric Film, Element Having Piezoelectric Film and Method for Manufacturing This Laminated Substrate
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US117568272023Structure Manufacturing Method and Manufacturing Device, and Light Irradiation Device
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US117441592023Piezoelectric Laminate, Method of Manufacturing Piezoelectric Laminate and Piezoelectric Element
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US117323802023Nitride Crystal Substrate and Method for Manufacturing the Same
SUMITOMO CHEMICAL COMPANY, LIMITED
0 cites - US116409062023Crystal Laminate, Semiconductor Device and Method for Manufacturing the Same
HOSEI UNIVERSITY
0 cites - US115577132023Laminated Substrate Having Piezoelectric Film, Element Having Piezoelectric Film and Method for Manufacturing This Laminated Substrate
SUMITOMO CHEMICAL COMPANY, LIMITED
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