4 Patents
- US125710992026Bis(ethylcyclopentadienyl)tin, Precursor for Chemical Vapor Deposition, Method of Producing Tin-containing Thin Film, and Method of Producing Tin Oxide Thin Film
KOJUNDO CHEMICAL LABORATORY CO., Ltd.
0 cites - US124105142025Vapor Deposition Source Material Used in Production of Film Containing Indium and One or More of the Other Metals, and the Method of Producing Film Containing Indium and One or More of the Other Metals
KOJUNDO CHEMICAL LABORATORY CO., Ltd.
0 cites - US118079392023Atomic Layer Deposition Method for Metal Thin Films
KOJUNDO CHEMICAL LABORATORY CO., Ltd.
0 cites - US116555382023Precursor for Chemical Vapor Deposition, and Light-blocking Container Containing Precursor for Chemical Vapor Deposition and Method for Producing the Same
KOJUNDO CHEMICAL LABORATORY CO., Ltd.
0 cites