3 Patents
- US124354202025Reaction Chamber for an Epitaxial Reactor of Semiconductor Material with Non-uniform Longitudinal Section and Reactor
LPE S.P.A.
0 cites - US123717792025Reaction Chamber Comprising a Rotating Element for the Deposition of a Semiconductor Material
DENSO CORPORATION
0 cites - US123314232025Reaction Chamber for a Deposition Reactor with Interspace and Lower Closing Element and Reactor
DENSO CORPORATION
0 cites