3 Patents
- US124566072025Auxiliary Plasma Source for Robust Ignition and Restrikes in a Plasma Chamber
Applied Materials, Inc.
0 cites - US122725752025Advanced Temperature Control for Wafer Carrier in Plasma Processing Chamber
Applied Materials, Inc.
0 cites - US118374792023Advanced Temperature Control for Wafer Carrier in Plasma Processing Chamber
Applied Materials, Inc.
0 cites