Patents/Inventors

Feng Q. Liu

San Jose, CAUS22 patents

18 Patents

US126065792026
Halogen-free Molybdenum-containing Precursors for Deposition of Molybdenum
Applied Materials, Inc.
0 cites
US125989692026
Flexible Monomer for Smooth Polymer Surface
Applied Materials, Inc.
0 cites
US125936292026
Selective Deposition Processes on Semiconductor Substrates
Applied Materials, Inc.
0 cites
US125753922026
Method to Deposit Metal Cap for Interconnect
APPLIED MATERIALS, Inc.
0 cites
US125435232026
Chlorine-free Removal of Molybdenum Oxides from Substrates
Applied Materials, Inc.
0 cites
US124158242025
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US123946202025
Benzyl Compound Passivation for Selective Deposition and Selective Etch Protection
Applied Materials, Inc.
0 cites
US122813822025
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US122813872025
Method of Depositing Metal Films
Applied Materials, Inc.
0 cites
US122725512025
Selective Metal Removal with Flowable Polymer
Applied Materials, Inc.
0 cites
US119461352024
Low Temperature Deposition of Iridium Containing Films
Applied Materials, Inc.
0 cites
US119423302024
Methods for Selective Dry Etching Gallium Oxide
Applied Materials, Inc.
0 cites
US118916902024
Molybdenum Thin Films by Oxidation-reduction
APPLIED MATERIALS, Inc.
0 cites
US118942332024
Electronic Device Having an Oxygen Free Platinum Group Metal Film
Applied Materials, Inc.
0 cites
US117870082023
Chemical Mechanical Polishing with Applied Magnetic Field
Applied Materials, Inc.
0 cites
US117607682023
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US117027332023
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US116437212023
Low Temperature Deposition of Iridium Containing Films
Applied Materials, Inc.
0 cites