Fang Ruan

9 Patents

• US125640212026

  Method of Processing a Substrate

  Applied Materials, Inc.

  0 cites
• US118624752024

  Gas Mixer to Enable RPS Purging

  Applied Materials, Inc.

  0 cites
• US118481782023

  Optical Absorption Sensor for Semiconductor Processing

  Applied Materials, Inc.

  0 cites
• US118147162023

  Faceplate Having Blocked Center Hole

  Applied Materials, Inc.

  0 cites
• US118107642023

  Faceplate with Edge Flow Control

  Applied Materials, Inc.

  0 cites
• US118043632023

  Chamber Components for Gas Delivery Modulation

  Applied Materials, Inc.

  0 cites
• US117988202023

  Gas Delivery Systems and Methods

  Applied Materials, Inc.

  0 cites
• US116825442023

  Cover Wafer for Semiconductor Processing Chamber

  Applied Materials, Inc.

  0 cites
• US116138082023

  Clean Processes for Boron Carbon Film Deposition

  Applied Materials, Inc.

  0 cites