4 Patents
- US122725622025Oxygen and Iodine-containing Hydrofluorocarbon Compound for Etching Semiconductor Structures
L'aire Liquide, Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude
0 cites - US121878532025Silicon-based Self-assembling Monolayer Compositions and Surface Preparation Using the Same
American Air Liquide, Inc.
0 cites - 0 cites
- US117988112023Iodine-containing Fluorocarbon and Hydrofluorocarbon Compounds for Etching Semiconductor Structures
American Air Liquide, Inc.
0 cites