Patents/Inventors

Eswaranand Venkatasubramanian

Santa Clara, CAUS26 patents

22 Patents

US125557412026
Magnetic Housing Systems
Applied Materials, Inc.
0 cites
US125506512026
Selective Etching of Silicon-containing Material Relative to Metal-doped Boron Films
Applied Materials, Inc.
0 cites
US125347972026
Vapor-phase Precursor Seeding for Diamond Film Deposition
National University Of Singapore
0 cites
US124865772025
Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials, Inc.
0 cites
US124630362025
High Density Carbon Films for Patterning Applications
Applied Materials, Inc.
0 cites
US123621812025
Methods of Forming Thermally Stable Carbon Film
Applied Materials, Inc.
0 cites
US123277332025
Methods to Reduce UNCD Film Roughness
National University Of Singapore
0 cites
US120376792024
Method of Forming a Diamond Film
Applied Materials, Inc.
0 cites
US120149252024
Metal-doped Carbon Hardmasks
Applied Materials, Inc.
0 cites
US119461342024
In Situ Nucleation for Nanocrystalline Diamond Film Deposition
Applied Materials, Inc.
0 cites
US118942302024
Tribological Properties of Diamond Films
Applied Materials, Inc.
0 cites
US118428972023
High Density Carbon Films for Patterning Applications
Applied Materials, Inc.
0 cites
US117840422023
Carbon Hard Masks for Patterning Applications and Methods Related Thereto
APPLIED MATERIALS, Inc.
0 cites
US116768582023
High Bias Deposition of High Quality Gapfill
APPLIED MATERIALS, Inc.
0 cites
US116383742023
Multicolor Approach to DRAM STI Active Cut Patterning
Applied Materials, Inc.
0 cites
US116211602023
Doped and Undoped Vanadium Oxides for Low-k Spacer Applications
APPLIED MATERIALS, Inc.
0 cites
US116035912023
Pulsed Plasma (DC/RF) Deposition of High Quality C Films for Patterning
Applied Materials Inc.
0 cites
US115944162023
Tribological Properties of Diamond Films
Applied Materials, Inc.
0 cites
US115877642023
Magnetic Housing Systems
Applied Materials, Inc.
0 cites
US115606262023
Substrate Processing Chamber
Applied Materials, Inc.
0 cites
US115574662023
Tuneable Uniformity Control Utilizing Rotational Magnetic Housing
Applied Materials, Inc.
0 cites
US115574782023
In-situ High Power Implant to Relieve Stress of a Thin Film
Applied Materials, Inc.
0 cites