2 Patents
- US120831572024Use of Polylysine Dendrimers in the Prevention and Management of Acne-prone Skin and Acneic Skin
LUCAS MEYER COSMETICS
0 cites - US117521682023Methods of Using Cosmetic Compositions Comprising Exopolysaccharides Derived from Microbial Mats
LUCAS MEYER COSMETICS CANADA Inc.
0 cites