10 Patents
- US126032522026Low-flow Radical Gas Geometrical Control Through Two-dimensional Compression Between Plasma Source and Chemical Reactor
Applied Materials, Inc.
0 cites - US125955602026Method and Apparatus for Supplying Improved Gas Flow to a Processing Volume of a Processing Chamber
Applied Materials, Inc.
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- US117323552023Method and Apparatus for Supplying Improved Gas Flow to a Processing Volume of a Processing Chamber
Applied Materials, Inc.
0 cites - US116978752023Method and Apparatus for Supplying Improved Gas Flow to a Processing Volume of a Processing Chamber
Applied Materials, Inc.
0 cites - 0 cites
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