13 Patents
- 0 cites
- US122875762025Underlayer Compositions and Patterning Methods
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
0 cites - US122769102025Photoresist Compositions and Pattern Formation Methods
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
0 cites - US121408662024Photoacid Generators, Photoresist Compositions, and Pattern Formation Methods
Rohm And Haas Electronic Materials LLC
0 cites - US119602062024Photoresist Composition, Coated Substrate Including the Photoresist Composition, and Method of Forming Electronic Device
ROHM AND HASS ELECTRONIC MATERIALS LLC
0 cites - US119472582024Photoacid-generating Monomer, Polymer Derived Therefrom, Photoresist Composition Including the Polymer, and Method of Forming a Photoresist Relief Image Using the Photoresist Composition
ROHM AND HASS ELECTRONIC MATERIALS LLC
0 cites - US119327132024Monomers, Polymers and Lithographic Compositions Comprising Same
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - 0 cites
- US118529722023Photoresist Compositions and Pattern Formation Methods
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - 0 cites
- US116135192023Photoacid-generating Monomer, Polymer Derived Therefrom, Photoresist Composition Including the Polymer, and Method of Forming a Photoresist Relief Image Using the Photoresist Composition
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - US115674082023Coating Composition for Use with an Overcoated Photoresist
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites - US115502172023Photoresist Composition, Coated Substrate Including the Photoresist Composition, and Method of Forming Electronic Device
ROHM AND HAAS ELECTRONIC MATERIALS LLC
0 cites