Patents/Inventors

Du Zhang

Albany, NYUS23 patents

11 Patents

US126181542026
Selective Non-plasma Deposition of Mask Protection Material
Tokyo Electron Limited
0 cites
US126222342026
Selective In-situ Carbon-based Mask Protection
Tokyo Electron Limited
0 cites
US125989322026
Methods and Structures for Improving Etch Profile of Underlying Layers
Tokyo Electron Limited
0 cites
US124348802025
Storage Box
0 cites
US124244472025
Method to Selectively Etch Silicon Nitride to Silicon Oxide Using Water Crystallization
Tokyo Electron Limited
0 cites
US124008632025
Method for Etching for Semiconductor Fabrication
TOKYO ELECTRON LIMITED
0 cites
USD10885382025
Storage Box
0 cites
US123082122025
In-situ Adsorbate Formation for Plasma Etch Process
Tokyo Electron Limited
0 cites
US122371722025
Etch Process for Oxide of Alkaline Earth Metal
Tokyo Electron Limited
0 cites
US121319142024
Selective Etching with Fluorine, Oxygen and Noble Gas Containing Plasmas
Université D'orleans
0 cites
US118043802023
High-throughput Dry Etching of Films Containing Silicon-oxygen Components or Silicon-nitrogen Components by Proton-mediated Catalyst Formation
Tokyo Electron Limited
0 cites