4 Patents
- US125796282026Overlay Measurement Between Layers of a Semiconductor Specimen Based on Center of Symmetry (COS) Localization
Applied Materials Israel Ltd.
0 cites - US125117202025Image Denoising for Examination of a Semiconductor Specimen
Applied Materials Israel Ltd.
0 cites - US124237982025Shape Localization for Examining a Semiconductor Specimen
Applied Materials Israel Ltd.
0 cites - US118625222024Accuracy Improvements in Optical Metrology0 cites