11 Patents
- US125605322026Apparatus for Measuring Radical Density Distribution Based on Light Absorption and Operating Method Thereof
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US125435352026Chuck Assembly, Fabrication System Therewith, and Method of Fabricating Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - US124890112025Chuck Assembly, Fabrication System Therewith, and Method of Fabricating Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US123277092025Antennas, Circuits for Generating Plasma, Plasma Processing Apparatus, and Methods of Manufacturing Semiconductor Devices Using the Same
Samsung Electronics Co., Ltd.
0 cites - US122100452025Impedance Measurement Jig and Method of Controlling a Substrate-processing Apparatus Using the Jig
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120209032024Plasma Etching Method and Semiconductor Device Fabrication Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US116580392023Plasma Etching Apparatus, Plasma Etching Method, and Semiconductor Device Fabrication Method Including the Plasma Etching Method
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US115453412023Plasma Etching Method and Semiconductor Device Fabrication Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites