Dongseok Han

4 Patents

• US125463932026

  Substrate Processing Apparatus

  Samsung Electronics Co., Ltd.

  0 cites
• US124760892025

  Plasma Processing Apparatus

  Samsung Electronics Co., Ltd.

  0 cites
• US122223622025

  Method of Measuring Parameters of Plasma, Apparatus for Measuring Parameters of Plasma, Plasma Processing System, and Method of Processing Wafer

  SAMSUNG ELECTRONICS CO., Ltd.

  0 cites
• US121835552024

  Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same

  SAMSUNG ELECTRONICS CO., Ltd.

  0 cites