8 Patents
- US125735902026Plasma Processing Apparatus and Method of Manufacturing Semiconductor Device by Using Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US125435352026Chuck Assembly, Fabrication System Therewith, and Method of Fabricating Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - US124890112025Chuck Assembly, Fabrication System Therewith, and Method of Fabricating Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US122223622025Method of Measuring Parameters of Plasma, Apparatus for Measuring Parameters of Plasma, Plasma Processing System, and Method of Processing Wafer
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120209032024Plasma Etching Method and Semiconductor Device Fabrication Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - 0 cites
- US115453412023Plasma Etching Method and Semiconductor Device Fabrication Method Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites