Patents/Inventors

Dmitry Lubomirsky

Cupertino, CAUS32 patents

30 Patents

US125663812026
Chamber and Methods of Cooling a Substrate After Baking
Applied Materials, Inc.
0 cites
US125487422026
Corrosion Resistant Ground Shield of Processing Chamber
Applied Materials, Inc.
0 cites
US124889672025
Extreme Uniformity Heated Substrate Support Assembly
Applied Materials, Inc.
0 cites
US124068332025
Ion Extraction Optics Having Non Uniform Grid Assembly
Applied Materials, Inc.
0 cites
US123728742025
System Architecture of Manufacturing of Semiconductor Wafers
Applied Materials, Inc.
0 cites
US123409792025
Semiconductor Processing Chamber for Improved Precursor Flow
Applied Materials, Inc.
0 cites
US122886752025
Cylindrical Cavity with Impedance Shifting by Irises in a Power-supplying Waveguide
Applied Materials, Inc.
0 cites
US122042462025
Metal Oxide Resist Patterning with Electrical Field Guided Post-exposure Bake
Applied Materials, Inc.
0 cites
US121818012024
Chamber and Methods of Treating a Substrate After Exposure to Radiation
Applied Materials, Inc.
0 cites
US121462192024
Flow Control Features of CVD Chambers
Applied Materials, Inc.
0 cites
US121256802024
Ion Extraction Assembly Having Variable Electrode Thickness for Beam Uniformity Control
Applied Materials, Inc.
0 cites
US121129722024
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor Process Chamber
APPLIED MATERIALS, Inc.
0 cites
US120092282024
Low Temperature Chuck for Plasma Processing Systems
Applied Materials, Inc.
0 cites
US119729302024
Cylindrical Cavity with Impedance Shifting by Irises in a Power-supplying Waveguide
Applied Materials, Inc.
0 cites
US119341032024
Apparatus for Post Exposure Bake of Photoresist
APPLIED MATERIALS, Inc.
0 cites
US119159112024
Two Piece Electrode Assembly with Gap for Plasma Control
Applied Materials, Inc.
0 cites
US119159502024
Multi-zone Semiconductor Substrate Supports
Applied Materials, Inc.
0 cites
US119011612024
Methods and Apparatus for Symmetrical Hollow Cathode Electrode and Discharge Mode for Remote Plasma Processes
APPLIED MATERIALS, Inc.
0 cites
US118347442023
Ceramic Showerheads with Conductive Electrodes
Applied Materials, Inc.
0 cites
US118158162023
Apparatus for Post Exposure Bake of Photoresist
Applied Materials, Inc.
0 cites
US117354412023
Systems and Methods for Improved Semiconductor Etching and Component Protection
Applied Materials, Inc.
0 cites
US117281392023
Process Chamber for Cyclic and Selective Material Removal and Etching
Applied Materials, Inc.
0 cites
US117156252023
Semiconductor Processing Chamber
Applied Materials, Inc.
0 cites
US116370022023
Methods and Systems to Enhance Process Uniformity
Applied Materials, Inc.
0 cites
US116095052023
Apparatus and Methods for Verification and Re-use of Process Fluids
Applied Materials, Inc.
0 cites
US115916932023
Ceramic Showerheads with Conductive Electrodes
Applied Materials, Inc.
0 cites
US115944282023
Low Temperature Chuck for Plasma Processing Systems
Applied Materials, Inc.
0 cites
US115877712023
Chemistry Compatible Coating Material for Advanced Device On-wafer Particle Performance
Applied Materials, Inc.
0 cites
US115628902023
Corrosion Resistant Ground Shield of Processing Chamber
Applied Materials, Inc.
0 cites
US115574642023
Semiconductor Chamber Coatings and Processes
Applied Materials, Inc.
0 cites