9 Patents
- US125720852026Device and Method for Measuring Substrates for Semiconductor Lithography
Carl Zeiss SMT GmbH
0 cites - 0 cites
- US123073342025Method and Device for Evaluating a Statistically Distributed Measured Value in the Examination of an Element of a Photolithography Process
Carl Zeiss SMT GmbH
0 cites - US121115792024Method and Apparatus for Evaluating an Unknown Effect of Defects of an Element of a Photolithography Process
Carl Zeiss SMT GmbH
0 cites - US120011452024Apparatus and Method for Analyzing an Element of a Photolithography Process with the Aid of a Transformation Model
Carl Zeiss SMT GmbH
0 cites - 0 cites
- US118927692024Method for Detecting an Object Structure and Apparatus for Carrying Out the Method
Carl Zeiss SMT GmbH
0 cites - US117748592023Method and Apparatus for Evaluating an Unknown Effect of Defects of an Element of a Photolithography Process
Carl Zeiss SMT GmbH
0 cites - US116311682023Method, Computer Program and Apparatus for Determining a Quality of a Mask of a Photolithography Apparatus
Carl Zeiss SMT GmbH
0 cites