9 Patents
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- US125675722026Plasma Behaviors Predicted by Current Measurements During Asymmetric Bias Waveform Application
Advanced Energy Industries, Inc.
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- US118428842023Spatial Monitoring and Control of Plasma Processing Environments
Advanced Energy Industries, Inc.
0 cites - US116107612023Synchronization Between an Excitation Source and a Substrate Bias Supply
Advanced Energy Industries, Inc.
0 cites