9 Patents
- US125325322026Epitaxial Features in Semiconductor Devices and Method of Manufacturing
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123494352025Vertical Device Having a Protrusion Source
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US122835962025Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120808002024Semiconductor Devices with Modified Source/drain Feature and Methods Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120273702024Method of Forming an Integrated Circuit Using a Patterned Mask Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119161312024Vertical Device Having a Protrusion Source
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US119011882024Method for Improved Critical Dimension Uniformity in a Semiconductor Device Fabrication Process
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118551672023Structure and Formation Method of Semiconductor Device with Nanosheet Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117423532023Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites