6 Patents
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- US118239102023Systems and Methods for Improving Planarity Using Selective Atomic Layer Etching (ALE)
Tokyo Electron Limited
0 cites - US117422412023ALD (atomic Layer Deposition) Liner for via Profile Control and Related Applications
TOKYO ELECTRON LIMITED
0 cites - US116519672023Non-atomic Layer Deposition (ALD) Method of Forming Sidewall Passivation Layer During High Aspect Ratio Carbon Layer Etch
Tokyo Electron Limited
0 cites - US116211642023Method for Critical Dimension (CD) Trim of an Organic Pattern Used for Multi-patterning Purposes
Tokyo Electron Limited
0 cites - US116211902023Method for Filling Recessed Features in Semiconductor Devices with a Low-resistivity Metal
Tokyo Electron Limited
0 cites