4 Patents
- US125637822026Fabrication of Gate-all-around Integrated Circuit Structures Having Common Metal Gates and Having Gate Dielectrics with Differentiated Dipole Layers
Intel Corporation
0 cites - US123100602025Gate-all-around Integrated Circuit Structures Having Uniform Threshold Voltages and Tight Gate Endcap Tolerances
Intel Corporation
0 cites - US121193442024Multi-layer Etch Stop Layers for Advanced Integrated Circuit Structure Fabrication
Intel Corporation
0 cites - 0 cites