26 Patents
- 0 cites
- US125751542026Methods for Pre-deposition Treatment of a Work-function Metal Layer
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US125503742026Semiconductor Device and Formation Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US125139612025Selective Etching to Increase Threshold Voltage Spread
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125060072025Method of Manufacturing Semiconductor Devices and Semiconductor Devices
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124179182025Semiconductor Device Having Doped Gate Dielectric Layer and Method for Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - 0 cites
- US122727352025Transistor Gate Structures and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122551042025Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122437862025Semiconductor Device and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US121762512024Semiconductor Device with Profiled Work-function Metal Gate Electrode and Method of Making
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US121425312024Pre-deposition Treatment for FET Technology and Devices Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120876372024Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120742062024Integrated Circuit Device with Improved Reliability
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120515942024Method for Forming Semiconductor Device Structure with Gate
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120402352024Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120209912024High-k Gate Dielectric and Method Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119617322024Controlling Threshold Voltages Through Blocking Layers
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119617682024CMOS Finfet Structures Including Work-function Materials Having Different Proportions of Crystalline Orientations and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119359572024Geometry for Threshold Voltage Tuning on Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119232402024Method of Forming Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US118550982023Semiconductor Devices Having Dipole-inducing Elements
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118044092023Semiconductor Device with Profiled Work-function Metal Gate Electrode and Method of Making
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
0 cites - US117423952023Selective Etching to Increase Threshold Voltage Spread
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US116825892023CMOS Finfet Structures Including Work-function Materials Having Different Proportions of Crystalline Orientations and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites