36 Patents
- US126157952026Semiconductor Device and Formation Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US125934952026Semiconductor Device and Method of Manufacture
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US125433352026Multilayer Masking Layer and Method of Forming Same
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US125016902025Hardmask Formation with Hybrid Materials in Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124143532025Method for Forming Semiconductor Structure
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123763392025Semiconductor Device Structure and Method for Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123493812025Dielectric Isolation Structure for Multi-gate Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US123289292025Method of Forming Thin Dummy Sidewall Spacers for Transistors with Reduced Pitches
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US123241852025Semiconductor Device, Finfet Device and Methods of Forming the Same
Taiwan Semicoductor Manufacturing Company, Ltd.
0 cites - US122725532025Multi-layer Photo Etching Mask Including Organic and Inorganic Materials
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US122373932025Method of Fabricating a Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122182412025Semiconductor Device Structure with Etch Stop Layer for Reducing RC Delay
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121660762024Semiconductor Device and Methods of Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121660352024Finfet with Bowl-shaped Gate Isolation and Method
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121259112024Method of Modulating Stress of Dielectric Layers
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - US121129882024Hybrid Isolation Regions Having Upper and Lower Portions with Seams
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121131132024Semiconductor Device with a Core-shell Feature and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121129422024Deposition Process for Forming Semiconductor Device and System
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120947842024Method for Manufacturing Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US120876412024Method for Forming Semiconductor Structure with Fins Using a Multilayer Mask Structure for Etching to Form Nanostructures
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US120805532024Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US120625782024Prevention of Contact Bottom Void in Semiconductor Fabrication
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd
0 cites - 0 cites
- US120274232024Forming Isolation Regions for Separating Fins and Gate Stacks
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US119844852024Semiconductor Device, Finfet Device and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119488432024Method for Forming Hardmask Formation by Hybrid Materials in Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118880492024Dielectric Isolation Structure for Multi-gate Transistors
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118551852023Multilayer Masking Layer and Method of Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118375052023Formation of Hybrid Isolation Regions Through Recess and Re-deposition
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118307362023Multi-layer Photo Etching Mask Including Organic and Inorganic Materials
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US118108242023Semiconductor Device and Manufacturing Method Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117252782023Systems and Methods for a Plasma Enhanced Deposition of Material on a Semiconductor Substrate
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - 0 cites
- US116005302023Semiconductor Device and Method of Manufacture
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites