12 Patents
- US125018422025Non-volatile Memory Device and Manufacturing Technology
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US124446502025Etch Stop Layer for Memory Device Formation
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123546952025Trench Formation Scheme for Programmable Metallization Cell to Prevent Metal Redeposit
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123027672025Buffer Layer in Memory Cell to Prevent Metal Redeposition
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122741822025Sidewall Spacer Structure for Memory Cell
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US120274202024Etch Stop Layer for Memory Device Formation
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US119250322024Memory Device with Flat-top Bottom Electrodes and Methods for Forming the Same
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US118189622023Sidewall Spacer Structure for Memory Cell
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US117857862023Trench Formation Scheme for Programmable Metallization Cell to Prevent Metal Redeposit
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US117858612023Semiconductor Structure and Method of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites - 0 cites