26 Patents
- US126222632026Forming Dielectric Film with High Resistance to Tilting
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US126106092026Method of Forming Finfet with Protected Low-k Gate Spacers
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US126047252026Interlevel Dielectric Structure in Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125060012025Low-k Feature Formation Processes and Structures Formed Thereby
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US124630912025Methods of Forming Semiconductor Device Structures
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US124143202025Fin Field-effect Transistor Device with Composite Liner for the Fin
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US123680442025Methods of Forming Dielectric Layers Through Deposition and Anneal Processes
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122781762025Integrated Circuit Structure and Method for Forming the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US122610422025Forming Nitrogen-containing Layers as Oxidation Blocking Layers
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122552412025Low-k Feature Formation Processes and Structures Formed Thereby
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122551382025Interconnect Structures of Semiconductor Device and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US121762062024Varying Temperature Anneal for Film and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US121486962024Methods for Reducing Dual Damascene Distortion
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US121486522024Silicon Oxide Layer for Oxidation Resistance and Method Forming Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US119488412024Forming Nitrogen-containing Low-k Gate Spacer
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
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- US119292812024Reducing Oxidation by Etching Sacrificial and Protection Layer Separately
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites - US119232942024Interconnect Structures of Semiconductor Device and Methods of Forming the Same
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - 0 cites
- US119012192024Methods of Forming Semiconductor Device Structures
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US118944642024Fin Field-effect Transistor Device with Composite Liner for the Fin
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117422012023Method of Filling Gaps with Carbon and Nitrogen Doped Film
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - US117156372023Varying Temperature Anneal for Film and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117053272023Low-k Feature Formation Processes and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites - US116409782023Low-k Feature Formation Processes and Structures Formed Thereby
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites