7 Patents
- US125975852026Shape-based Proximity Effect Correction Method for Throughput, Patterning Fidelity, and Contrast Enhancement of Particle Beam Lithography and Imaging Structure
NATIONAL TAIPEI UNIVERSITY
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- US123931142025Semiconductor Apparatus and Method of Operating the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US118993672024Dummy Insertion for Improving Throughput of Electron Beam Lithography
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd
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