Patents/Inventors

Christopher Bohn

Santa Monica, CAUS1 patent

2 Patents

US122550472025
Embedded High-z Marker Material and Process for Alignment of Multilevel Ebeam Lithography
HRL LABORATORIES, LLC
0 cites
US118238642023
Embedded High-z Marker Material and Process for Alignment of Multilevel Ebeam Lithography
HRL LABORATORIES, LLC
0 cites