Patents/Inventors

Chiyu Zhu

HelsinkiFI26 patents

22 Patents

US126181342026
Normal Pulse Profile Modification in a Film Deposition Process
ASM IP Holding B.V.
0 cites
US125776592026
Methods and Assemblies for Selectively Depositing Molybdenum
ASM IP Holding B.V.
0 cites
US123593152025
Deposition of Oxides and Nitrides
ASM IP Holding B.V.
0 cites
US123548722025
Method for Forming Doped Metal Oxide Films on a Substrate by Cyclical Deposition and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites
US123200122025
Thermal Atomic Layer Etching Processes
ASM IP Holding B.V.
0 cites
US123126962025
Thermal Atomic Layer Etching Processes
ASM IP Holding B.V.
0 cites
US122835202025
Selective Deposition Method to Form Air Gaps
ASM IP Holding B.V.
0 cites
US122373922025
Titanium Aluminum and Tantalum Aluminum Thin Films
ASM IP Holding B.V.
0 cites
US122179542025
Method of Cleaning a Surface
ASM IP Holding B.V.
0 cites
US121660992024
Methods for Forming a Semiconductor Device Structure and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites
US121295452024
Precursor Capsule, a Vessel and a Method
ASM IP Holding B.V.
0 cites
US121192282024
Deposition Method
ASM IP Holding B.V.
0 cites
US120946862024
Atomic Layer Etching Processes
ASM IP Holding B.V.
0 cites
US119087362024
Methods for Depositing a Molybdenum Metal Film Over a Dielectric Surface of a Substrate by a Cyclical Deposition Process and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites
US118548762023
Systems and Methods for Cobalt Metalization
ASM IP Holding B.V.
0 cites
US117495622023
Selective Deposition Method to Form Air Gaps
ASM IP Holding B.V.
0 cites
US117394282023
Thermal Atomic Layer Etching Processes
ASM IP HOLDING B.V.
0 cites
US117394272023
Thermal Atomic Layer Etching Processes
ASM IP HOLDING B.V.
0 cites
US116950542023
Methods for Forming a Semiconductor Device Structure and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites
US116580302023
Method for Forming Doped Metal Oxide Films on a Substrate by Cyclical Deposition and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites
US116408992023
Atomic Layer Etching Processes
ASM IP HOLDING B.V.
0 cites
US115812202023
Methods for Depositing a Molybdenum Metal Film Over a Dielectric Surface of a Substrate by a Cyclical Deposition Process and Related Semiconductor Device Structures
ASM IP Holding B.V.
0 cites