Patents/Inventors

Chishio Koshimizu

MiyagiJP32 patents

37 Patents

US125422552026
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US125371702026
Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US124379702025
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
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US123879072025
Plasma Processing Apparatus and Substrate Processing Method
TOKYO ELECTRON LIMITED
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US123621442025
Plasma Processing Apparatus and Method for Controlling Source Frequency of Source Radio-frequency Power
TOKYO ELECTRON LIMITED
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US123343052025
Plasma Processing Apparatus
Tokyo Electron Limited
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US123004652025
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US122665112025
Substrate Support and Substrate Processing Apparatus
TOKYO ELECTRON LIMITED
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US122610272025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US122494862025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US122494872025
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US121761872024
Cleaning Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US121658422024
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US121256722024
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
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US121256792024
Plasma Processing Apparatus and Processing Method
TOKYO ELECTRON LIMITED
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US120572942024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US120464522024
Plasma Processing Apparatus
Tokyo Electron Limited
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US120208992024
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US119553142024
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US119357272024
Substrate Processing Method
TOKYO ELECTRON LIMITED
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US119086652024
Plasma Processing Apparatus and Measurement Method
Tokyo Electron Limited
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US118759772024
Plasma Processing Apparatus and Plasma Processing Method
TOKYO ELECTRON LIMITED
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US118715032024
Plasma Processing Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US118307042023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
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US118043682023
Cleaning Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117721382023
Processing Apparatus and Processing Method, and Gas Cluster Generating Apparatus and Gas Cluster Generating Method
TOKYO ELECTRON LIMITED
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US117640342023
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
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US117640822023
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US117421802023
Plasma Processing Method and Plasma Processing Apparatus
Tokyo Electron Limited
0 cites
US117421812023
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US117421822023
Control Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US117421832023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
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US117421842023
Plasma Processing Apparatus and Plasma Processing Method
Tokyo Electron Limited
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US116641962023
Detecting Method and Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
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US115811702023
Plasma Processing Apparatus and Processing Method
TOKYO ELECTRON LIMITED
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US115747982023
Plasma Processing Apparatus and Control Method
TOKYO ELECTRON LIMITED
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US115628872023
Plasma Processing Apparatus and Etching Method
TOKYO ELECTRON LIMITED
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