31 Patents
- US126158242026Multi-stage Etching Process for Contact Formation in a Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US125016792025Interconnect Structures for Semiconductor Devices and Methods of Manufacturing the Same
Taiwan Semiconductor Manufacturing Company Limited
0 cites - US124955982025Semiconductor Device and Manufacturing Method Thereof
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US124778212025Semiconductor Device Having Air Spacers
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US123100512025Fin Field-effect Transistor Device Having Contact Plugs with Re-entrant Profile
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122939472025Gap Patterning for Metal-to-source/drain Plugs in a Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122727312025Middle-of-line Interconnect Structure and Manufacturing Method
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122680272025Middle-of-line Interconnect Structure and Manufacturing Method
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US122119372025Field Effect Transistor Device with Air Gap Spacer in Source/drain Contact
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
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- US121425322024Interconnect Structures for Semiconductor Devices and Methods of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LIMITED
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- US120947682024Method for Sealing a Seam, Semiconductor Structure, and Method for Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
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- US120092582024Self-aligned Interconnect with Protection Layer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - 0 cites
- US119161472024Fin Field-effect Transistor Device Having Contact Plugs with Re-entrant Profile
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd
0 cites - 0 cites
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- US118429302023Gap Patterning for Metal-to-source/drain Plugs in a Semiconductor Device
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites - US117697702023Methods of Forming a Semiconductor Device Having an Air Spacer
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites - US117570102023Multi-stage Etching Process for Contact Formation in a Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
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- US116263262023Interconnect Structures for Semiconductor Devices and Methods of Manufacturing the Same
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
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