6 Patents
- US122454152025Method of Manufacturing Semiconductor Device Having Protrusion of Word Line
NANYA TECHNOLOGY CORPORATION
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- US120149862024Method for Preparing Semiconductor Device Structure with Conductive Plugs of Different Aspect Ratios and Manganese-containing Lining Layer
NANYA TECHNOLOGY CORPORATION
0 cites - US118958262024Method for Preparing Semiconductor Device Structure with Air Gap
NANYA TECHNOLOGY CORPORATION
0 cites - US116462682023Semiconductor Device Structure with Conductive Plugs of Different Aspect Ratios and Manganese-containing Liner Having Different Thicknesses
NANYA TECHNOLOGY CORPORATION
0 cites - US115878852023Method for Fabricating Semiconductor Device with EMI Protection Structure
NANYA TECHNOLOGY CORPORATION
0 cites